The Chromium Nitride, better known as CrN, has many important features that suggest its use in many applications.

Also, in STS, is deposited with the latest technology HDP (High Density Plasma) which favors the formation of extremely compact layers.

Although the CrN can express a considerable hardness, it has a very tenacious structure, thanks to which it is possible to reproduce layers with thicknesses much higher compared to all the other coatings (up to 15 microns).

This advantage combined with excellent resistance to corrosion make the Chromium Nitride an extraordinary barrier to chemical attack and oxidation.

The low friction coefficient of this coating also allows to reduce the phenomena of seizure and microsolderings between sliding surfaces.

The CrN also has excellent resistance to thermal loads and it is therefore interesting to use in high temperature conditions.

Another important element is the ability to deposit the CrN at low temperatures (up to 180°C) by extending its application to a multitude of different materials.

The Chromium Nitride is also accepted by the FDA (Food Drug Administration).

Basic Composition Coating Structure Microhardness (HV 0.05) Coefficient of friction against 100 Cr 6 μm thickness (microns) Deposition Temperature (°C) Max Temperature of use (max ° C) Colour
Chromium Nitride Monolayer 1.800 0,5 1 - 10 140 - 480 750 Light Grey