PACVD (Plasma Assisted Chemical Vapor Deposition). In the case of the PACVD, the generation has place chemically. The elements which compose the coating are supplied under gaseous form through chemical reactions and are made available for deposition. The presence of plasma is essential to create the compounds to be deposited. The energy to initiate the chemical reactions in the case of conventional CVD process is provided by the temperature, in the case of the PACVD comes precisely from the plasma. This allows the reaction to be initiated even at low temperatures, up to room temperature.