PaCVD technology (DLC)
High-tech DLC coatings
In the case of PaCVD technology, Plasma-assisted Chemical Vapor Deposition, generation takes place chemically. The elements that make up the coating layer are supplied in gaseous form and are made available for deposition through chemical reactions. This technology offers the best performance for the deposition of high quality Diamond Like Carbon coatings.
The presence of plasma is essential for the formation of the compounds to be deposited. The energy to start the chemical reactions is supplied by the plasma. This allows the reaction to be started even at low temperatures.
We have fine-tuned our machines for maximum performance
In 2011 we began our strategic activity of continuous improvement of deposition technologies with the self-construction of our first PaCVD plant for DLC..
Today our machines are designed to ensure maximum precision and versatility, in order to allow high productivity and repeatability of the coating and its performance.